Effets limitant la performance des FET Tunnel

In this paper a two-dimensional analytical Tunnel-FET model is revised. It is used to evaluate performance enhancing measures for the TFET regarding device geometry and physical effects. The usage of hetero-junctions is discussed and a way to suppress the ambipolar behavior of the TFET is shown. In focus of this work are the emerging variability issues with this new type of device. Random-dopant-fluctuations (rdf) have a major influence on the device performance. This effect is analyzed and compared with rdf effects in a MOSFET device. The drawn conclusions lead to a
re-evaluation of performance limiting aspects of fabricated TFET devices.

In this paper a two-dimensional analytical Tunnel-FET model is revised. It is used to evaluate performance enhancing measures for the TFET regarding device geometry and physical effects. The usage of hetero-junctions is discussed and a way to suppress the ambipolar behavior of the TFET is shown. In focus of this work are the emerging variability issues with this new type of device. Random-dopant-fluctuations (rdf) have a major influence on the device performance. This effect is analyzed and compared with rdf effects in a MOSFET device. The drawn conclusions lead to a
re-evaluation of performance limiting aspects of fabricated TFET devices.

Random Dopant Fluctuation (RDF) Randomized Profiles Gaussian Doping Profiles Trap-Assisted- Tunneling (TAT) Double-Gate (DG) Tunnel-FET Analytical Modeling

Random Dopant Fluctuation (RDF) Randomized Profiles Gaussian Doping Profiles Trap-Assisted- Tunneling (TAT) Double-Gate (DG) Tunnel-FET Analytical Modeling